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Effect of the Hydroxyl-Ethyl-Cellulose Concentration in a Silicon Wafer Polishing Slurry on the Wafer Surface Roughness
Effect of the Hydroxyl-Ethyl-Cellulose Concentration in a Silicon Wafer Polishing Slurry on the Wafer Surface Roughness
Detailed Information
- Material Type
- 기사
- ISSN
- 03744884
- Author
- Cho, Kyu-chul
- Title/Author
- Effect of the Hydroxyl-Ethyl-Cellulose Concentration in a Silicon Wafer Polishing Slurry on the Wafer Surface Roughness / Kyu-chul Cho 저 ; Hyeongtag Jeon ; Jea-gun Park 공저
- Publish Info
- 서울 : 한국물리학회, 2006.
- Material Info
- pp. L507-L509
- Index Term-Uncontrolled
- EFFECT HYDROXYLETHYLCELLULOSE CONCENTRATION SILICON WAFER POLISHING SLURRY SURFACE ROUGHNESS
- Added Entry-Personal Name
- Jeon, Hyeongtag
- Added Entry-Personal Name
- Park, Jea-gun
- Control Number
- kjul:60096662
MARC
008070406s2006 ULKa a ENG■022 ▼a03744884
■1001 ▼aCho, Kyu-chul
■245 ▼aEffect of the Hydroxyl-Ethyl-Cellulose Concentration in a Silicon Wafer Polishing Slurry on the Wafer Surface Roughness▼dKyu-chul Cho 저▼eHyeongtag Jeon▼eJea-gun Park 공저
■260 ▼a서울▼b한국물리학회▼c2006.
■300 ▼app. L507-L509
■653 ▼aEFFECT▼aHYDROXYLETHYLCELLULOSE▼aCONCENTRATION▼aSILICON▼aWAFER▼aPOLISHING▼aSLURRY▼aSURFACE▼aROUGHNESS
■7001 ▼aJeon, Hyeongtag
■7001 ▼aPark, Jea-gun
■773 ▼tJournal of The Korean Physical Society▼gVol. 48 No. 4 (2006. 4)▼d2006, 04
■■URL ▼ahttp://www.kps.or.kr
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