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Mask Error Enhancement Factor Variation with Pattern Density for 65 nm and 90 nm Line Widths
Mask Error Enhancement Factor Variation with Pattern Density for 65 nm and 90 nm Line Widths
Detailed Information
- Material Type
- 기사
- ISSN
- 03744884
- Author
- Kang, Hye-young
- Title/Author
- Mask Error Enhancement Factor Variation with Pattern Density for 65 nm and 90 nm Line Widths / Hye-young Kang 저 ; Chang-ho Lee ; Sung-hyuck Kim ; Hye-keun Oh 공저
- Publish Info
- 서울 : 한국물리학회, 2006.
- Material Info
- pp. 246-249
- Index Term-Uncontrolled
- MASK ERROR ENHANCEMENT FACTOR VARIATION PATTERN DENSITY 65 NM 90 LINE WIDTHS
- Added Entry-Personal Name
- Lee, Chang-ho
- Added Entry-Personal Name
- Kim, Sung-hyuck
- Added Entry-Personal Name
- Oh, Hye-keun
- Control Number
- kjul:60096570
MARC
008070405s2006 ULKa a ENG■022 ▼a03744884
■1001 ▼aKang, Hye-young
■245 ▼aMask Error Enhancement Factor Variation with Pattern Density for 65 nm and 90 nm Line Widths▼dHye-young Kang 저▼eChang-ho Lee▼eSung-hyuck Kim▼eHye-keun Oh 공저
■260 ▼a서울▼b한국물리학회▼c2006.
■300 ▼app. 246-249
■653 ▼aMASK▼aERROR▼aENHANCEMENT▼aFACTOR▼aVARIATION▼aPATTERN▼aDENSITY▼a65▼aNM▼a90▼aLINE▼aWIDTHS
■7001 ▼aLee, Chang-ho
■7001 ▼aKim, Sung-hyuck
■7001 ▼aOh, Hye-keun
■773 ▼tJournal of The Korean Physical Society▼gVol. 48 No. 2 (2006. 2)▼d2006, 02
■■URL ▼ahttp://www.kps.or.kr
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