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Mask Error Enhancement Factor Variation with Pattern Density for 65 nm and 90 nm Line Widths
Mask Error Enhancement Factor Variation with Pattern Density for 65 nm and 90 nm Line Widths
Detailed Information
- 자료유형
- 기사
- ISSN
- 03744884
- 저자명
- Kang, Hye-young
- 서명/저자
- Mask Error Enhancement Factor Variation with Pattern Density for 65 nm and 90 nm Line Widths / Hye-young Kang 저 , Chang-ho Lee , Sung-hyuck Kim , Hye-keun Oh 공저
- 발행사항
- 서울 : 한국물리학회, 2006.
- 형태사항
- pp. 246-249
- 기타저자
- Lee, Chang-ho
- 기타저자
- Kim, Sung-hyuck
- 기타저자
- Oh, Hye-keun
- Control Number
- kjul:60096570
MARC
008070405s2006 ULKa a ENG■022 ▼a03744884
■1001 ▼aKang, Hye-young
■245 ▼aMask Error Enhancement Factor Variation with Pattern Density for 65 nm and 90 nm Line Widths▼dHye-young Kang 저▼eChang-ho Lee▼eSung-hyuck Kim▼eHye-keun Oh 공저
■260 ▼a서울▼b한국물리학회▼c2006.
■300 ▼app. 246-249
■653 ▼aMASK▼aERROR▼aENHANCEMENT▼aFACTOR▼aVARIATION▼aPATTERN▼aDENSITY▼a65▼aNM▼a90▼aLINE▼aWIDTHS
■7001 ▼aLee, Chang-ho
■7001 ▼aKim, Sung-hyuck
■7001 ▼aOh, Hye-keun
■773 ▼tJournal of The Korean Physical Society▼gVol. 48 No. 2 (2006. 2)▼d2006, 02
■■URL ▼ahttp://www.kps.or.kr
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