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Characteristics of SiOxNy Films Deposited by PECVD at Low-Temperature Using BTBAS-NH₃-O₂
Characteristics of SiOxNy Films Deposited by PECVD at Low-Temperature Using BTBAS-NH₃-O₂
Detailed Information
- Material Type
- 기사
- ISSN
- 03744884
- Author
- Lee, June Hee
- Title/Author
- Characteristics of SiOxNy Films Deposited by PECVD at Low-Temperature Using BTBAS-NH₃-O₂ / June Hee Lee 저 ; Chang Hyun Jeong ; Jong Tae Lim ; V. A. Zavaleyev ; Kyung Suk Min ; Se Jin Kyung ; Geun Young Yeom 공저
- Publish Info
- 서울 : 한국물리학회, 2006.
- Material Info
- pp. 89-92
- Index Term-Uncontrolled
- CHARACTERISTICS SIOXNY FILMS DEPOSITED PECVD LOWTEMPERATURE USING BTBASNH₃O₂
- Added Entry-Personal Name
- Jeong, Chang Hyun
- Added Entry-Personal Name
- Lim, Jong Tae
- Added Entry-Personal Name
- Zavaleyev, V. A.
- Added Entry-Personal Name
- Min, Kyung Suk
- Added Entry-Personal Name
- Kyung, Se Jin
- Added Entry-Personal Name
- Yeom, Geun Young
- Control Number
- kjul:60096516
MARC
008070404s2006 ULKa a ENG■022 ▼a03744884
■1001 ▼aLee, June Hee
■245 ▼aCharacteristics of SiOxNy Films Deposited by PECVD at Low-Temperature Using BTBAS-NH₃-O₂▼dJune Hee Lee 저▼eChang Hyun Jeong▼eJong Tae Lim▼eV. A. Zavaleyev▼eKyung Suk Min▼eSe Jin Kyung▼eGeun Young Yeom 공저
■260 ▼a서울▼b한국물리학회▼c2006.
■300 ▼app. 89-92
■653 ▼aCHARACTERISTICS▼aSIOXNY▼aFILMS▼aDEPOSITED▼aPECVD▼aLOWTEMPERATURE▼aUSING▼aBTBASNH₃O₂
■7001 ▼aJeong, Chang Hyun
■7001 ▼aLim, Jong Tae
■7001 ▼aZavaleyev, V. A.
■7001 ▼aMin, Kyung Suk
■7001 ▼aKyung, Se Jin
■7001 ▼aYeom, Geun Young
■773 ▼tJournal of The Korean Physical Society▼gVol. 48 No. 1 (2006. 1)▼d2006, 01
■■URL ▼ahttp://www.kps.or.kr
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