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Atomic Layer Deposition of Ultrathin Metal-Oxide Films for Nano-Scale Device Applications
Atomic Layer Deposition of Ultrathin Metal-Oxide Films for Nano-Scale Device Applications
상세정보
- 자료유형
- 기사
- ISSN
- 03744884
- 저자명
- Kim, Hyongsub
- 서명/저자
- Atomic Layer Deposition of Ultrathin Metal-Oxide Films for Nano-Scale Device Applications / Hyongsub Kim 저 , Paul C. McINTTRE 공저
- 발행사항
- 서울 : 한국물리학회, 2006.
- 형태사항
- pp. 5-17
- 기타저자
- Paul C. McINTTRE
- Control Number
- kjul:60096493
MARC
008070404s2006 ULKa a ENG■022 ▼a03744884
■1001 ▼aKim, Hyongsub
■245 ▼aAtomic Layer Deposition of Ultrathin Metal-Oxide Films for Nano-Scale Device Applications▼dHyongsub Kim 저▼ePaul C. McINTTRE 공저
■260 ▼a서울▼b한국물리학회▼c2006.
■300 ▼app. 5-17
■653 ▼aATOMIC▼aLAYER▼aDEPOSITION▼aULTRATHIN▼aMETALOXIDE▼aFILMS▼aNANOSCALE▼aDEVICE▼aAPPLICATIONS
■7001 ▼aPaul C. McINTTRE
■773 ▼tJournal of The Korean Physical Society▼gVol. 48 No. 1 (2006. 1)▼d2006, 01
■■URL ▼ahttp://www.kps.or.kr
