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A study on lateral distribution of implanted Ions in silicon
A study on lateral distribution of implanted Ions in silicon
Detailed Information
- 자료유형
- 기사
- ISSN
- 12297607
- 저자명
- Jung, Won Chae
- 서명/저자
- A study on lateral distribution of implanted Ions in silicon / Won Chae Jung , by Hyung Min Kim
- 발행사항
- 서울 : 한국전기전자재료학회, 2007.
- 형태사항
- pp. 173-179
- 기타저자
- Kim, Hyung Min
- Control Number
- kjul:60085891
MARC
008061213s2007 ULKa a ENG■022 ▼a12297607
■1001 ▼aJung, Won Chae
■245 ▼aA study on lateral distribution of implanted Ions in silicon▼dWon Chae Jung▼eby Hyung Min Kim
■260 ▼a서울▼b한국전기전자재료학회▼c2007.
■300 ▼app. 173-179
■653 ▼aSTUDY▼aLATERAL▼aDISTRIBUTION▼aIMPLANTED▼aIONS▼aSILICON
■7001 ▼aKim, Hyung Min
■773 ▼tTransactions on Electrical and Electronic Materials▼gVol.7, No.4 (2006 August)▼d2007, 08
■■URL ▼ahttp://www.kieeme.or.kr
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