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Dependence of Nanotopography Impact on Fumed Silica and Ceria Slurry Added with Surfactant for Shallow Trench Isolation Chemical Mechanical Polishing
Dependence of Nanotopography Impact on Fumed Silica and Ceria Slurry Added with Surfactant for Shallow Trench Isolation Chemical Mechanical Polishing
Detailed Information
- Material Type
- 기사
- ISSN
- 12250562
- Title/Author
- Dependence of Nanotopography Impact on Fumed Silica and Ceria Slurry Added with Surfactant for Shallow Trench Isolation Chemical Mechanical Polishing / Kyu-Chul Cho, Hyeongtag Jeon, Jea-Gun Park 저.
- Publish Info
- 서울 : 한국재료학회, 2006.
- Material Info
- pp. 308-311
- Index Term-Uncontrolled
- DEPENDENCE NANOTOPOGRAPHY IMPACT FUMED SILICA CERIA SLURRY ADDED SURFACTANT SHALLOW TRENCH ISOLATION CHEMICAL MECHANICAL POLISHING
- Added Entry-Personal Name
- Cho Kyu-Chul
- Added Entry-Personal Name
- Jeon Hyeongtag
- Added Entry-Personal Name
- Park Jea-Gun
- 모체레코드
- 모체정보확인
- Control Number
- kjul:60077983
MARC
008060912s2006 ULKa a KOR■022 ▼a12250562
■245 ▼aDependence of Nanotopography Impact on Fumed Silica and Ceria Slurry Added with Surfactant for Shallow Trench Isolation Chemical Mechanical Polishing▼dKyu-Chul Cho, Hyeongtag Jeon, Jea-Gun Park 저.
■260 ▼a서울▼b한국재료학회▼c2006.
■300 ▼app. 308-311
■653 ▼aDEPENDENCE▼aNANOTOPOGRAPHY▼aIMPACT▼aFUMED▼aSILICA▼aCERIA▼aSLURRY▼aADDED▼aSURFACTANT▼aSHALLOW▼aTRENCH▼aISOLATION▼aCHEMICAL▼aMECHANICAL▼aPOLISHING
■700 ▼aCho Kyu-Chul
■700 ▼aJeon Hyeongtag
■700 ▼aPark Jea-Gun
■773 ▼t한국재료학회지(Korean Journal of Materials Research)▼gVol. 16, No. 5, (2006 May)▼d2006, 05
■URL ▼ahttp://mrs-k.or.kr
■SIS ▼aS027076▼b60055267▼h8▼s2
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