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Analysis of Process Parameters to Improve On-Chip Linewidth Variation
Analysis of Process Parameters to Improve On-Chip Linewidth Variation
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MARC
008060529s2004 ULKa a ENG■022 ▼a15981657
■245 ▼aAnalysis of Process Parameters to Improve On-Chip Linewidth Variation▼dYun-Kyeong Jang, Doo-Youl Lee, Sung-Woo Lee
■260 ▼a서울▼b대한전자공학회▼c2004.
■300 ▼app. 100-105
■653 ▼aANALYSIS▼aPROCESS▼aPARAMETERS▼aIMPROVE▼aONCHIP▼aLINEWIDTH▼aVARIATION
■700 ▼aYun-Kyeong Jang, Doo-Youl Lee, Sung-Woo Lee
■773 ▼tJournal of Semiconductor Technology and Science▼gVolume 4, Number 2, (2004 June)▼d2004, 06
■URL ▼ahttp://www.jsts.org
■SIS ▼aS013702▼b60054120▼h8▼s2
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