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Effects of Thermal Contact Resistance on Film Growth Rate in a Horizontal MOCVD Reactor
Effects of Thermal Contact Resistance on Film Growth Rate in a Horizontal MOCVD Reactor
Detailed Information
- 자료유형
- 기사
- ISSN
- 1738494X
- 서명/저자
- Effects of Thermal Contact Resistance on Film Growth Rate in a Horizontal MOCVD Reactor / Ik-Tae Im, Nag Jung Choi, Masakazu Sugiyame, Yoshiyaki Nakano, Yukihiro Shimogaki, Byoung Ho Kim, Kwang-Sun Kim
- 발행사항
- 서울 : 대한기계학회, 2005.
- 형태사항
- pp. 1338-1346
- 모체레코드
- 모체정보확인
- Control Number
- kjul:60075923
MARC
008060517s2005 ULKa a ENG■022 ▼a1738494X
■245 ▼aEffects of Thermal Contact Resistance on Film Growth Rate in a Horizontal MOCVD Reactor▼dIk-Tae Im, Nag Jung Choi, Masakazu Sugiyame, Yoshiyaki Nakano, Yukihiro Shimogaki, Byoung Ho Kim, Kwang-Sun Kim
■260 ▼a서울▼b대한기계학회▼c2005.
■300 ▼app. 1338-1346
■653 ▼aEFFECTS▼aTHERMAL▼aCONTACT▼aRESISTANCE▼aFILM▼aGROWTH▼aRATE▼aHORIZONTAL▼aMOCVD▼aREACTOR
■700 ▼aIk-Tae Im, Nag Jung Choi, Masakazu Sugiyame, Yoshiyaki Nakano, Yukihiro Shimogaki, Byoung Ho Kim, Kwang-Sun Kim
■773 ▼tJournal of Mechanical Science and Technology▼gVol. 19 (No. 6)▼d2005, 06
■URL ▼ahttp://www.ksme.or.kr
■SIS ▼aS017621▼b60064619▼h8▼s2
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