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Evaluation of Citric Acid Added Cleaning Solution for Removal of Metallic Contaminants on Si Wafer Surface
Evaluation of Citric Acid Added Cleaning Solution for Removal of Metallic Contaminants on Si Wafer Surface
Detailed Information
- Material Type
- 기사
- ISSN
- 02561115
- Title/Author
- Evaluation of Citric Acid Added Cleaning Solution for Removal of Metallic Contaminants on Si Wafer Surface / Hye-Young Chung, Kyung-Soo Kim, Hyo-Yong Cho, Bo-Young Lee, Hak Do Yoo, Sang-Hak Lee
- Publish Info
- 서울 : 한국화학공학회, 2001.
- Material Info
- pp. 342-346
- Index Term-Uncontrolled
- EVALUATION CITRIC ACID ADDED CLEANING SOLUTION REMOVAL METALLIC CONTAMINANTS WAFER SURFACE
- Added Entry-Personal Name
- Hye-Young Chung, Kyung-Soo Kim, Hyo-Yong Cho, Bo-Young Lee, Hak Do Yoo, Sang-Hak Lee
- Host Item Entry
- The KOREAN International Journal of Chemical Engineering : Vol. 18 No. 3 (2001 May) 2001, 05
- 모체레코드
- 모체정보확인
- Control Number
- kjul:60071028
MARC
008060215s2001 ULKa a ENG■022 ▼a02561115
■245 ▼aEvaluation of Citric Acid Added Cleaning Solution for Removal of Metallic Contaminants on Si Wafer Surface▼dHye-Young Chung, Kyung-Soo Kim, Hyo-Yong Cho, Bo-Young Lee, Hak Do Yoo, Sang-Hak Lee
■260 ▼a서울▼b한국화학공학회▼c2001.
■300 ▼app. 342-346
■653 ▼aEVALUATION▼aCITRIC▼aACID▼aADDED▼aCLEANING▼aSOLUTION▼aREMOVAL▼aMETALLIC▼aCONTAMINANTS▼aWAFER▼aSURFACE
■700 ▼aHye-Young Chung, Kyung-Soo Kim, Hyo-Yong Cho, Bo-Young Lee, Hak Do Yoo, Sang-Hak Lee
■773 ▼tThe KOREAN International Journal of Chemical Engineering▼gVol. 18 No. 3 (2001 May)▼d2001, 05
■SIS ▼aS018105▼b60066239▼h8▼s2
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