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Evaluation of Citric Acid Added Cleaning Solution for Removal of Metallic Contaminants on Si Wafer Surface
Evaluation of Citric Acid Added Cleaning Solution for Removal of Metallic Contaminants on Si Wafer Surface
Detailed Information
- 자료유형
- 기사
- ISSN
- 02561115
- 서명/저자
- Evaluation of Citric Acid Added Cleaning Solution for Removal of Metallic Contaminants on Si Wafer Surface / Hye-Young Chung, Kyung-Soo Kim, Hyo-Yong Cho, Bo-Young Lee, Hak Do Yoo, Sang-Hak Lee
- 발행사항
- 서울 : 한국화학공학회, 2001.
- 형태사항
- pp. 342-346
- 모체레코드
- 모체정보확인
- Control Number
- kjul:60071028
MARC
008060215s2001 ULKa a ENG■022 ▼a02561115
■245 ▼aEvaluation of Citric Acid Added Cleaning Solution for Removal of Metallic Contaminants on Si Wafer Surface▼dHye-Young Chung, Kyung-Soo Kim, Hyo-Yong Cho, Bo-Young Lee, Hak Do Yoo, Sang-Hak Lee
■260 ▼a서울▼b한국화학공학회▼c2001.
■300 ▼app. 342-346
■653 ▼aEVALUATION▼aCITRIC▼aACID▼aADDED▼aCLEANING▼aSOLUTION▼aREMOVAL▼aMETALLIC▼aCONTAMINANTS▼aWAFER▼aSURFACE
■700 ▼aHye-Young Chung, Kyung-Soo Kim, Hyo-Yong Cho, Bo-Young Lee, Hak Do Yoo, Sang-Hak Lee
■773 ▼tThe KOREAN International Journal of Chemical Engineering▼gVol. 18 No. 3 (2001 May)▼d2001, 05
■SIS ▼aS018105▼b60066239▼h8▼s2
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