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A Unified Global Self-Consistent Model of a Capacitively and Inductively Coupled Plasma Etching System
A Unified Global Self-Consistent Model of a Capacitively and Inductively Coupled Plasma Etching System
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008060210s2000 ULKa a ENG■022 ▼a02561115
■245 ▼aA Unified Global Self-Consistent Model of a Capacitively and Inductively Coupled Plasma Etching System▼dYoon-Bong Hahn, Stephen J. Pearton
■260 ▼a서울▼b한국화학공학회▼c2000.
■300 ▼app. 304-309
■653 ▼aUNIFIED▼aGLOBAL▼aSELFCONSISTENT▼aMODEL▼aCAPACITIVELY▼aINDUCTIVELY▼aCOUPLED▼aPLASMA▼aETCHING▼aSYSTEM
■700 ▼aYoon-Bong Hahn, Stephen J. Pearton
■773 ▼tThe KOREAN International Journal of Chemical Engineering▼gVol. 17 No. 3 (2000 May)▼d2000, 05
■SIS ▼aS018099▼b60066239▼h8▼s2
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