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A Unified Global Self-Consistent Model of a Capacitively and Inductively Coupled Plasma Etching System
A Unified Global Self-Consistent Model of a Capacitively and Inductively Coupled Plasma Etching System
Detailed Information
- Material Type
- 기사
- ISSN
- 02561115
- Title/Author
- A Unified Global Self-Consistent Model of a Capacitively and Inductively Coupled Plasma Etching System / Yoon-Bong Hahn, Stephen J. Pearton
- Publish Info
- 서울 : 한국화학공학회, 2000.
- Material Info
- pp. 304-309
- Index Term-Uncontrolled
- UNIFIED GLOBAL SELFCONSISTENT MODEL CAPACITIVELY INDUCTIVELY COUPLED PLASMA ETCHING SYSTEM
- Added Entry-Personal Name
- Yoon-Bong Hahn, Stephen J. Pearton
- Host Item Entry
- The KOREAN International Journal of Chemical Engineering : Vol. 17 No. 3 (2000 May) 2000, 05
- 모체레코드
- 모체정보확인
- Control Number
- kjul:60069618
MARC
008060210s2000 ULKa a ENG■022 ▼a02561115
■245 ▼aA Unified Global Self-Consistent Model of a Capacitively and Inductively Coupled Plasma Etching System▼dYoon-Bong Hahn, Stephen J. Pearton
■260 ▼a서울▼b한국화학공학회▼c2000.
■300 ▼app. 304-309
■653 ▼aUNIFIED▼aGLOBAL▼aSELFCONSISTENT▼aMODEL▼aCAPACITIVELY▼aINDUCTIVELY▼aCOUPLED▼aPLASMA▼aETCHING▼aSYSTEM
■700 ▼aYoon-Bong Hahn, Stephen J. Pearton
■773 ▼tThe KOREAN International Journal of Chemical Engineering▼gVol. 17 No. 3 (2000 May)▼d2000, 05
■SIS ▼aS018099▼b60066239▼h8▼s2
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