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Characteristics of Aluminum Films Prepared by Metalorganic Chemical Vapor Deposition Using Dimethylethylamine Alane on the Plasma-Pretreated TiN Surfaces
Characteristics of Aluminum Films Prepared by Metalorganic Chemical Vapor Deposition Using Dimethylethylamine Alane on the Plasma-Pretreated TiN Surfaces
Detailed Information
- 자료유형
- 기사
- ISSN
- 02561115
- 서명/저자
- Characteristics of Aluminum Films Prepared by Metalorganic Chemical Vapor Deposition Using Dimethylethylamine Alane on the Plasma-Pretreated TiN Surfaces / Do-Heyoung Kim, Byung-Yub Kim
- 발행사항
- 서울 : 한국화학공학회, 2000.
- 형태사항
- pp. 449-454
- 키워드
- CHARACTERISTICS ALUMINUM FILMS PREPARED METALORGANIC CHEMICAL VAPOR DEPOSITION USING DIMETHYLETHYLAMINE ALANE PLASMAPRETREATED SURFACES
- 기본자료저록
- The KOREAN International Journal of Chemical Engineering : Vol. 17 No. 4 (2000 July) 2000, 07
- 모체레코드
- 모체정보확인
- Control Number
- kjul:60069536
MARC
008060210s2000 ULKa a ENG■022 ▼a02561115
■245 ▼aCharacteristics of Aluminum Films Prepared by Metalorganic Chemical Vapor Deposition Using Dimethylethylamine Alane on the Plasma-Pretreated TiN Surfaces▼dDo-Heyoung Kim, Byung-Yub Kim
■260 ▼a서울▼b한국화학공학회▼c2000.
■300 ▼app. 449-454
■653 ▼aCHARACTERISTICS▼aALUMINUM▼aFILMS▼aPREPARED▼aMETALORGANIC▼aCHEMICAL▼aVAPOR▼aDEPOSITION▼aUSING▼aDIMETHYLETHYLAMINE▼aALANE▼aPLASMAPRETREATED▼aSURFACES
■700 ▼aDo-Heyoung Kim, Byung-Yub Kim
■773 ▼tThe KOREAN International Journal of Chemical Engineering▼gVol. 17 No. 4 (2000 July)▼d2000, 07
■SIS ▼aS018100▼b60066239▼h8▼s2
