서브메뉴
검색
Stability of Interface Voids in Copper Metallization for Integrated Circuit Applications
Stability of Interface Voids in Copper Metallization for Integrated Circuit Applications
상세정보
MARC
008050913s2004 ULKa a ENG■022 ▼a12259438
■245 ▼aStability of Interface Voids in Copper Metallization for Integrated Circuit Applications▼d저 J.H. Choy
■260 ▼a서울▼b대한금속.재료학회▼c2004.
■300 ▼app. 417-422
■653 ▼aSTABILITY▼aINTERFACE▼aVOIDS▼aCOPPER▼aMETALLIZATION▼aINTEGRATED▼aCIRCUIT▼aAPPLICATIONS
■700 ▼aJ.H. Choy
■773 ▼tMetals and Materials▼gVOL.10 NO.5 (2004 OCTOBER)▼d2004, 10
■SIS ▼aS010856▼b60013551▼h1▼s2▼fP


