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Effect of Substrate Bias Voltage on the Texture and Microstructure of Cu Thin Films Deposited by Ion Beam Deposition
Effect of Substrate Bias Voltage on the Texture and Microstructure of Cu Thin Films Deposited by Ion Beam Deposition
Detailed Information
- Material Type
- 기사
- ISSN
- 12259438
- Title/Author
- Effect of Substrate Bias Voltage on the Texture and Microstructure of Cu Thin Films Deposited by Ion Beam Deposition / 공저 Jae-Won Lim,Minoru Isshiki
- Publish Info
- 서울 : 대한금속.재료학회, 2003.
- Material Info
- pp. 201-206
- Index Term-Uncontrolled
- EFFECT SUBSTRATE BIAS VOLTAGE TEXTURE MICROSTRUCTURE CU FILMS DEPOSITED ION BEAM DEPOSITION
- Added Entry-Personal Name
- Jae-Won Lim,Minoru Isshiki
- Host Item Entry
- Metals and Materials : VOL.9 NO.2 (2003 APRIL) 2003, 04
- 모체레코드
- 모체정보확인
- Control Number
- kjul:60017749
MARC
008000108s2003 ULKa a ENG■022 ▼a12259438
■245 ▼aEffect of Substrate Bias Voltage on the Texture and Microstructure of Cu Thin Films Deposited by Ion Beam Deposition▼d공저 Jae-Won Lim,Minoru Isshiki
■260 ▼a서울▼b대한금속.재료학회▼c2003.
■300 ▼app. 201-206
■653 ▼aEFFECT▼aSUBSTRATE▼aBIAS▼aVOLTAGE▼aTEXTURE▼aMICROSTRUCTURE▼aCU▼aFILMS▼aDEPOSITED▼aION▼aBEAM▼aDEPOSITION
■700 ▼aJae-Won Lim,Minoru Isshiki
■773 ▼tMetals and Materials▼gVOL.9 NO.2 (2003 APRIL)▼d2003, 04
■SIS ▼aS009197▼b60013551▼h8▼s2
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