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Effect of Substrate Bias Voltage on the Texture and Microstructure of Cu Thin Films Deposited by Ion Beam Deposition
Effect of Substrate Bias Voltage on the Texture and Microstructure of Cu Thin Films Deposited by Ion Beam Deposition
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MARC
008000108s2003 ULKa a ENG■022 ▼a12259438
■245 ▼aEffect of Substrate Bias Voltage on the Texture and Microstructure of Cu Thin Films Deposited by Ion Beam Deposition▼d공저 Jae-Won Lim,Minoru Isshiki
■260 ▼a서울▼b대한금속.재료학회▼c2003.
■300 ▼app. 201-206
■653 ▼aEFFECT▼aSUBSTRATE▼aBIAS▼aVOLTAGE▼aTEXTURE▼aMICROSTRUCTURE▼aCU▼aFILMS▼aDEPOSITED▼aION▼aBEAM▼aDEPOSITION
■700 ▼aJae-Won Lim,Minoru Isshiki
■773 ▼tMetals and Materials▼gVOL.9 NO.2 (2003 APRIL)▼d2003, 04
■SIS ▼aS009197▼b60013551▼h8▼s2
