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Growth and Properties of Completely Amorphous Vnadium Oxide Cathode Thin Film with Pt Co-Sputtering Method
Growth and Properties of Completely Amorphous Vnadium Oxide Cathode Thin Film with Pt Co-Sputtering Method
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008000108s2003 ULKa a ENG■022 ▼a12259438
■245 ▼aGrowth and Properties of Completely Amorphous Vnadium Oxide Cathode Thin Film with Pt Co-Sputtering Method▼d공저 Han-Ki Kim,Tae-Yeon Seong
■260 ▼a서울▼b대한금속.재료학회▼c2003.
■300 ▼app. 135-140
■653 ▼aGROWTH▼aPROPERTIES▼aCOMPLETELY▼aAMORPHOUS▼aVNADIUM▼aOXIDE▼aCATHODE▼aFILM▼aPT▼aCOSPUTTERING▼aMETHOD
■700 ▼aHan-Ki Kim,Tae-Yeon Seong
■773 ▼tMetals and Materials▼gVOL.9 NO.2 (2003 APRIL)▼d2003, 04
■SIS ▼aS009197▼b60013551▼h8▼s2
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