서브메뉴
검색
Characteristics of Ru Etching Using O₂/Cl₂Plasmas
Characteristics of Ru Etching Using O₂/Cl₂Plasmas
Detailed Information
- 자료유형
- 기사
- ISSN
- 12259438
- 서명/저자
- Characteristics of Ru Etching Using O₂/Cl₂Plasmas / 저 Hyoun Woo Kim
- 발행사항
- 서울 : 대한금속.재료학회, 2002.
- 형태사항
- pp. 487-494
- 기타저자
- Hyoun Woo Kim
- 모체레코드
- 모체정보확인
- Control Number
- kjul:60017664
MARC
008000108s2002 ULKa a ENG■022 ▼a12259438
■245 ▼aCharacteristics of Ru Etching Using O₂/Cl₂Plasmas▼d저 Hyoun Woo Kim
■260 ▼a서울▼b대한금속.재료학회▼c2002.
■300 ▼app. 487-494
■653 ▼aCHARACTERISTICS▼aETCHING▼aUSING▼aO₂CL₂PLASMAS
■700 ▼aHyoun Woo Kim
■773 ▼tMetals and Materials▼gVOL.8 NO.5 (2002 OCTOBER)▼d2002, 10
■SIS ▼aS009194▼b60013551▼h8▼s2
Preview
Export
ChatGPT Discussion
AI Recommended Related Books
Подробнее информация.
- Бронирование
- не существует
- моя папка
- Reference Materials for Thesis Writing
- Reference Materials for Research Ethics
- Job-Related Books
