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Study of Oxygen and Carbon Species on Si Substrate DUring In-Situ Cleaning Prior to High-Quality Epitaxial Deposition
Study of Oxygen and Carbon Species on Si Substrate DUring In-Situ Cleaning Prior to High-Quality Epitaxial Deposition
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MARC
008000107s2002 ULKa a ENG■022 ▼a12259438
■245 ▼aStudy of Oxygen and Carbon Species on Si Substrate DUring In-Situ Cleaning Prior to High-Quality Epitaxial Deposition▼d공저 Hyoun-Woo Kim,Kwang-Sik Kim
■260 ▼a서울▼b대한금속.재료학회▼c2002.
■300 ▼app. 183-190
■653 ▼aSTUDY▼aOXYGEN▼aCARBON▼aSPECIES▼aSUBSTRATE▼aINSITU▼aCLEANING▼aPRIOR▼aHIGHQUALITY▼aEPITAXIAL▼aDEPOSITION
■700 ▼aHyoun-Woo Kim,Kwang-Sik Kim
■773 ▼tMetals and Materials▼gVOL.8 NO.2 (2002 APRIL)▼d2002, 04
■SIS ▼aS009191▼b60013551▼h8▼s2
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