서브메뉴
검색
Negative Ion Etching of Al-Si-Cu by Employing a Magnetic Filter in Halogen Plasmas
Negative Ion Etching of Al-Si-Cu by Employing a Magnetic Filter in Halogen Plasmas
Detailed Information
MARC
008000107s2002 ULKa a ENG■022 ▼a12259438
■245 ▼aNegative Ion Etching of Al-Si-Cu by Employing a Magnetic Filter in Halogen Plasmas▼d공저 Bong-Ju Lee,Yasuhiro Horiike
■260 ▼a서울▼b대한금속.재료학회▼c2002.
■300 ▼app. 85-88
■653 ▼aNEGATIVE▼aION▼aETCHING▼aALSICU▼aEMPLOYING▼aMAGNETIC▼aFILTER▼aHALOGEN▼aPLASMAS
■700 ▼aBong-Ju Lee,Yasuhiro Horiike
■773 ▼tMetals and Materials▼gVOL.8 NO.1 (2002 FEBRUARY)▼d2002, 02
■SIS ▼aS009190▼b60013551▼h8▼s2
Preview
Export
ChatGPT Discussion
AI Recommended Related Books
Подробнее информация.
- Бронирование
- не существует
- моя папка
- Reference Materials for Thesis Writing
- Reference Materials for Research Ethics
- Job-Related Books


