MARC

 008000107s2002        ULKa    a                          ENG
■022    ▼a12259438
■245    ▼aNegative  Ion  Etching  of  Al-Si-Cu  by  Employing  a  Magnetic  Filter  in  Halogen  Plasmas▼d공저  Bong-Ju  Lee,Yasuhiro  Horiike
■260    ▼a서울▼b대한금속.재료학회▼c2002.
■300    ▼app.  85-88
■653    ▼aNEGATIVE▼aION▼aETCHING▼aALSICU▼aEMPLOYING▼aMAGNETIC▼aFILTER▼aHALOGEN▼aPLASMAS
■700    ▼aBong-Ju  Lee,Yasuhiro  Horiike
■773    ▼tMetals  and  Materials▼gVOL.8  NO.1  (2002  FEBRUARY)▼d2002,  02
■SIS    ▼aS009190▼b60013551▼h8▼s2

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