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Effect of In-Situ Plasma Cleaning On the Crystalline Quality of silicon Homoepitaxial Films
Effect of In-Situ Plasma Cleaning On the Crystalline Quality of silicon Homoepitaxial Films
Detailed Information
- Material Type
- 기사
- ISSN
- 12259438
- Title/Author
- Effect of In-Situ Plasma Cleaning On the Crystalline Quality of silicon Homoepitaxial Films / 공저 Kwang-sik Kim,Hyoun-woo Kim
- Publish Info
- 서울 : 대한금속.재료학회, 2001.
- Material Info
- pp. 637-642
- Index Term-Uncontrolled
- EFFECT INSITU PLASMA CLEANING CRYSTALLINE QUALITY SILICON HOMOEPITAXIAL FILMS
- Added Entry-Personal Name
- Kwang-sik Kim,Hyoun-woo Kim
- Host Item Entry
- Metals and Materials : VOL.7 NO.6 (2001 DECEMBER) 2001, 12
- 모체레코드
- 모체정보확인
- Control Number
- kjul:60017533
MARC
008000107s2001 ULKa a ENG■022 ▼a12259438
■245 ▼aEffect of In-Situ Plasma Cleaning On the Crystalline Quality of silicon Homoepitaxial Films▼d공저 Kwang-sik Kim,Hyoun-woo Kim
■260 ▼a서울▼b대한금속.재료학회▼c2001.
■300 ▼app. 637-642
■653 ▼aEFFECT▼aINSITU▼aPLASMA▼aCLEANING▼aCRYSTALLINE▼aQUALITY▼aSILICON▼aHOMOEPITAXIAL▼aFILMS
■700 ▼aKwang-sik Kim,Hyoun-woo Kim
■773 ▼tMetals and Materials▼gVOL.7 NO.6 (2001 DECEMBER)▼d2001, 12
■SIS ▼aS009189▼b60013551▼h8▼s2
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