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Effect of In-Situ Plasma Cleaning On the Crystalline Quality of silicon Homoepitaxial Films
Effect of In-Situ Plasma Cleaning On the Crystalline Quality of silicon Homoepitaxial Film...
Effect of In-Situ Plasma Cleaning On the Crystalline Quality of silicon Homoepitaxial Films

Detailed Information

자료유형  
 기사
ISSN  
12259438
서명/저자  
Effect of In-Situ Plasma Cleaning On the Crystalline Quality of silicon Homoepitaxial Films / 공저 Kwang-sik Kim,Hyoun-woo Kim
발행사항  
서울 : 대한금속.재료학회, 2001.
형태사항  
pp. 637-642
키워드  
EFFECT INSITU PLASMA CLEANING CRYSTALLINE QUALITY SILICON HOMOEPITAXIAL FILMS
기타저자  
Kwang-sik Kim,Hyoun-woo Kim
기본자료저록  
Metals and Materials : VOL.7 NO.6 (2001 DECEMBER) 2001, 12
모체레코드  
모체정보확인
Control Number  
kjul:60017533

MARC

 008000107s2001        ULKa    a                          ENG
■022    ▼a12259438
■245    ▼aEffect  of  In-Situ  Plasma  Cleaning  On  the  Crystalline  Quality  of  silicon  Homoepitaxial  Films▼d공저  Kwang-sik  Kim,Hyoun-woo  Kim
■260    ▼a서울▼b대한금속.재료학회▼c2001.
■300    ▼app.  637-642
■653    ▼aEFFECT▼aINSITU▼aPLASMA▼aCLEANING▼aCRYSTALLINE▼aQUALITY▼aSILICON▼aHOMOEPITAXIAL▼aFILMS
■700    ▼aKwang-sik  Kim,Hyoun-woo  Kim
■773    ▼tMetals  and  Materials▼gVOL.7  NO.6  (2001  DECEMBER)▼d2001,  12
■SIS    ▼aS009189▼b60013551▼h8▼s2

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