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Effect of In-Situ Plasma Cleaning On the Crystalline Quality of silicon Homoepitaxial Films
Effect of In-Situ Plasma Cleaning On the Crystalline Quality of silicon Homoepitaxial Films
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MARC
008000107s2001 ULKa a ENG■022 ▼a12259438
■245 ▼aEffect of In-Situ Plasma Cleaning On the Crystalline Quality of silicon Homoepitaxial Films▼d공저 Kwang-sik Kim,Hyoun-woo Kim
■260 ▼a서울▼b대한금속.재료학회▼c2001.
■300 ▼app. 637-642
■653 ▼aEFFECT▼aINSITU▼aPLASMA▼aCLEANING▼aCRYSTALLINE▼aQUALITY▼aSILICON▼aHOMOEPITAXIAL▼aFILMS
■700 ▼aKwang-sik Kim,Hyoun-woo Kim
■773 ▼tMetals and Materials▼gVOL.7 NO.6 (2001 DECEMBER)▼d2001, 12
■SIS ▼aS009189▼b60013551▼h8▼s2
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