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Characteristics of TiN Thin Films Grown by ALD Using TiCl₄and NH₃
Characteristics of TiN Thin Films Grown by ALD Using TiCl₄and NH₃ / 공저 C.H.Ahn,S.G.Cho...
Characteristics of TiN Thin Films Grown by ALD Using TiCl₄and NH₃

Detailed Information

자료유형  
 기사
ISSN  
12259438
서명/저자  
Characteristics of TiN Thin Films Grown by ALD Using TiCl₄and NH₃ / 공저 C.H.Ahn,S.G.Cho,H.J.Lee
발행사항  
서울 : 대한금속.재료학회, 2001.
형태사항  
pp. 621-626
키워드  
CHARACTERISTICS FILMS GROWN ALD USING TICL₄AND NH₃
기타저자  
C.H.Ahn,S.G.Cho,H.J.Lee
기본자료저록  
Metals and Materials : VOL.7 NO.6 (2001 DECEMBER) 2001, 12
모체레코드  
모체정보확인
Control Number  
kjul:60017526

MARC

 008000107s2001        ULKa    a                          ENG
■022    ▼a12259438
■245    ▼aCharacteristics  of  TiN  Thin  Films  Grown  by  ALD  Using  TiCl₄and  NH₃▼d공저  C.H.Ahn,S.G.Cho,H.J.Lee
■260    ▼a서울▼b대한금속.재료학회▼c2001.
■300    ▼app.  621-626
■653    ▼aCHARACTERISTICS▼aFILMS▼aGROWN▼aALD▼aUSING▼aTICL₄AND▼aNH₃
■700    ▼aC.H.Ahn,S.G.Cho,H.J.Lee
■773    ▼tMetals  and  Materials▼gVOL.7  NO.6  (2001  DECEMBER)▼d2001,  12
■SIS    ▼aS009189▼b60013551▼h8▼s2

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