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Pattern Density and Pitch Effects on Chemical-Mechanical Polishing
Pattern Density and Pitch Effects on Chemical-Mechanical Polishing
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MARC
008000107s2001 ULKa a ENG■022 ▼a12259438
■245 ▼aPattern Density and Pitch Effects on Chemical-Mechanical Polishing▼d공저 Young Bae Park,Il Young Yoo
■260 ▼a서울▼b대한금속.재료학회▼c2001.
■300 ▼app. 403-411
■653 ▼aPATTERN▼aDENSITY▼aPITCH▼aEFFECTS▼aCHEMICALMECHANICAL▼aPOLISHING
■700 ▼aYoung Bae Park,Il Young Yoo
■773 ▼tMetals and Materials▼gVOL.7 NO.4 (2001 AUGUST)▼d2001, 08
■SIS ▼aS009187▼b60013551▼h8▼s2
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