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Pattern Density and Pitch Effects on Chemical-Mechanical Polishing
Pattern Density and Pitch Effects on Chemical-Mechanical Polishing / 공저 Young Bae Park,I...
Pattern Density and Pitch Effects on Chemical-Mechanical Polishing

Detailed Information

자료유형  
 기사
ISSN  
12259438
서명/저자  
Pattern Density and Pitch Effects on Chemical-Mechanical Polishing / 공저 Young Bae Park,Il Young Yoo
발행사항  
서울 : 대한금속.재료학회, 2001.
형태사항  
pp. 403-411
키워드  
PATTERN DENSITY PITCH EFFECTS CHEMICALMECHANICAL POLISHING
기타저자  
Young Bae Park,Il Young Yoo
기본자료저록  
Metals and Materials : VOL.7 NO.4 (2001 AUGUST) 2001, 08
모체레코드  
모체정보확인
Control Number  
kjul:60017440

MARC

 008000107s2001        ULKa    a                          ENG
■022    ▼a12259438
■245    ▼aPattern  Density  and  Pitch  Effects  on  Chemical-Mechanical  Polishing▼d공저  Young  Bae  Park,Il  Young  Yoo
■260    ▼a서울▼b대한금속.재료학회▼c2001.
■300    ▼app.  403-411
■653    ▼aPATTERN▼aDENSITY▼aPITCH▼aEFFECTS▼aCHEMICALMECHANICAL▼aPOLISHING
■700    ▼aYoung  Bae  Park,Il  Young  Yoo
■773    ▼tMetals  and  Materials▼gVOL.7  NO.4  (2001  AUGUST)▼d2001,  08
■SIS    ▼aS009187▼b60013551▼h8▼s2

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