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The Effects of Vacuum Annealing on the Film Properties of Titanium Boride (TiBx) Grown on (100)Si Substrate
The Effects of Vacuum Annealing on the Film Properties of Titanium Boride (TiBx) Grown on (100)Si Substrate
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MARC
008000107s2001 ULKa a ENG■022 ▼a12259438
■245 ▼aThe Effects of Vacuum Annealing on the Film Properties of Titanium Boride (TiBx) Grown on (100)Si Substrate▼d공저 Young-Ki Lee,Jung-Yuel Kim,You-Kee Lee
■260 ▼a서울▼b대한금속.재료학회▼c2001.
■300 ▼app. 359-366
■653 ▼aEFFECTS▼aVACUUM▼aANNEALING▼aFILM▼aPROPERTIES▼aTITANIUM▼aBORIDE▼aTIBX▼aGROWN▼a100SI▼aSUBSTRATE
■700 ▼aYoung-Ki Lee,Jung-Yuel Kim,You-Kee Lee
■773 ▼tMetals and Materials▼gVOL.7 NO.4 (2001 AUGUST)▼d2001, 08
■SIS ▼aS009187▼b60013551▼h8▼s2
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