서브메뉴
검색
The Effects of Vacuum Annealing on the Film Properties of Titanium Boride (TiBx) Grown on (100)Si Substrate
The Effects of Vacuum Annealing on the Film Properties of Titanium Boride (TiBx) Grown on (100)Si Substrate
Detailed Information
MARC
008000107s2001 ULKa a ENG■022 ▼a12259438
■245 ▼aThe Effects of Vacuum Annealing on the Film Properties of Titanium Boride (TiBx) Grown on (100)Si Substrate▼d공저 Young-Ki Lee,Jung-Yuel Kim,You-Kee Lee
■260 ▼a서울▼b대한금속.재료학회▼c2001.
■300 ▼app. 359-366
■653 ▼aEFFECTS▼aVACUUM▼aANNEALING▼aFILM▼aPROPERTIES▼aTITANIUM▼aBORIDE▼aTIBX▼aGROWN▼a100SI▼aSUBSTRATE
■700 ▼aYoung-Ki Lee,Jung-Yuel Kim,You-Kee Lee
■773 ▼tMetals and Materials▼gVOL.7 NO.4 (2001 AUGUST)▼d2001, 08
■SIS ▼aS009187▼b60013551▼h8▼s2
Preview
Export
ChatGPT Discussion
AI Recommended Related Books
Buch Status
- Reservierung
- frei buchen
- Meine Mappe
- Reference Materials for Thesis Writing
- Reference Materials for Research Ethics
- Job-Related Books
