인쇄
미지정
도서명 :
Formation Mechanism
and Structural Characteristics of Low-Dielectric-Constant SiOC(-H) Films Deposited by Using Plasma-Enhanced Chemical-Vapor Deposition with DMDMS and O₂ Precursors
저 자 :
Chang Young Kim
청구기호 :
소장처 :
참고자료실(관광학관2층)
대출요구사항 :
출력