인쇄
미지정
도서명 :
Characteristics of A
l₂O₃ Thin Films Deposited Using Dimethylaluminum Isopropoxide and Trimethylaluminum Precursors by the Plasma-Enhanced Atomic-Layer Deposition Method
저 자 :
Koo, Jaehyoung
청구기호 :
소장처 :
참고자료실(관광학관2층)
대출요구사항 :
출력