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1
Cell Signal Distribution Characteristics For High Density FeRAM
Cell Signal Distribution Characteristics For High Density FeRAM
Hee-Bok Kang, | 대한전자공학회 | 2004 ,
2
Resistive Switching Characteristics of HfO₂ Grown by Atomic Layer Deposition
Resistive Switching Characteristics of HfO₂ Grown by Atomic Layer Deposition
Kyong-Rae Kim, | 한국물리학회 | 2007 ,
3
Metal Precursor Effects on Deposition and Interfacial Characteristics of HfO₂ Dielectrics Grown by Atomic Layer Deposition
Metal Precursor Effects on Deposition and Interfacial Characteristics of HfO₂ Dielectrics Grown by Atomic Layer Deposition
In-Sung Park, | 한국물리학회 | 2007 ,
4
Electrical and Reliability Characteristics of HfO₂ MOS Capacitor with Mo Metal Gate Electrode
Electrical and Reliability Characteristics of HfO₂ MOS Capacitor with Mo Metal Gate Electrode
In-Sung Park, | 한국물리학회 | 2007 ,
5
Study of a Thin Al₂O₃/TaN Absorber Stack on Ru-Capped Multilayers
Study of a Thin Al₂O₃/TaN Absorber Stack on Ru-Capped Multilayers
Tae Geun Kim, | 한국물리학회 | 2007 ,
6
Fabrication of Two-Dimensional Periodic Structures in an Amorphous Silicon Film by Four-Beam Interference Lithography
Fabrication of Two-Dimensional Periodic Structures in an Amorphous Silicon Film by Four-Beam Interference Lithography
Geon Joon Lee, | 한국물리학회 | 2007 ,
7
Study on the Characteristics of SiO₂ Films Prepared by Hydrogen-Assisted Low-Pressure Radical Oxidation Using Batch-Type Equipment with a 100-Wafers of 300-mm-Diameter Capability
Study on the Characteristics of SiO₂ Films Prepared by Hydrogen-Assisted Low-Pressure Radical Oxidation Using Batch-Type Equipment with a 100-Wafers of 300-mm-Diameter Capability
Jae-Jong Han, | 한국물리학회 | 2006 ,
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