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Post-Annealing Effect on SiOC(-H) Composite Films Deposited by Using Plasma-Enhanced Chemical-Vapor Deposition
Post-Annealing Effect on SiOC(-H) Composite Films Deposited by Using Plasma-Enhanced Chemical-Vapor Deposition
Detailed Information
- Material Type
- 기사
- ISSN
- 03744884
- Author
- Kyoung Suk Oh.
- Title/Author
- Post-Annealing Effect on SiOC(-H) Composite Films Deposited by Using Plasma-Enhanced Chemical-Vapor Deposition / Kyoung Suk Oh. ; Young Hun Yu ; Chi Kyu Choi ; Kwang-man Lee.
- Publish Info
- 서울 : 한국물리학회, 2006.
- Material Info
- pp. 1680-1685
- Index Term-Uncontrolled
- POSTANNEALING EFFECT SIOCH COMPOSITE FILMS DEPOSITED USING PLASMAENHANCED CHEMICALVAPOR DEPOSITION
- Added Entry-Personal Name
- Young Hun Yu
- Added Entry-Personal Name
- Chi Kyu Choi
- Added Entry-Personal Name
- Kwang-man Lee.
- 모체레코드
- 모체정보확인
- Control Number
- kjul:60097215
MARC
008070413s2006 ULKa a ENG■022 ▼a03744884
■1001 ▼aKyoung Suk Oh.
■245 ▼aPost-Annealing Effect on SiOC(-H) Composite Films Deposited by Using Plasma-Enhanced Chemical-Vapor Deposition ▼dKyoung Suk Oh. ▼eYoung Hun Yu▼eChi Kyu Choi▼eKwang-man Lee.
■260 ▼a서울▼b한국물리학회▼c2006.
■300 ▼app. 1680-1685
■653 ▼aPOSTANNEALING▼aEFFECT▼aSIOCH▼aCOMPOSITE▼aFILMS▼aDEPOSITED▼aUSING▼aPLASMAENHANCED▼aCHEMICALVAPOR▼aDEPOSITION
■7001 ▼aYoung Hun Yu
■7001 ▼aChi Kyu Choi
■7001 ▼aKwang-man Lee.
■773 ▼tJournal of The Korean Physical Society▼gVol. 48 No. 6 (2006. 6)▼d2006, 06
■URL ▼ahttp://www.kps.or.kr
■SIS ▼aS028403▼b60077342▼h8▼s2
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